Search Prime Grants

DESC0024811

Project Grant

Overview

Grant Description
Electrodeposition of 3D interconnects for HEP detectors
Funding Goals
ELECTRODEPOSITION OF 3D INTERCONNECTS FOR HEP DETECTORS
Place of Performance
Clayton, Ohio 45315-8983 United States
Geographic Scope
Single Zip Code
Analysis Notes
Amendment Since initial award the End Date has been extended from 11/11/24 to 04/13/26 and the total obligations have increased 561% from $204,997 to $1,354,971.
Faraday Technology was awarded Project Grant DESC0024811 worth $1,354,971 from the Office of Science in February 2024 with work to be completed primarily in Clayton Ohio United States. The grant has a duration of 2 years 2 months and was awarded through assistance program 81.049 Office of Science Financial Assistance Program. The Project Grant was awarded through grant opportunity FY 2024 Phase I Release 1.

SBIR Details

Research Type
SBIR Phase I
Title
Electrodeposition of 3D Interconnects for HEP Detectors (30b)
Abstract
With the large channel counts and fine granularity of High Energy Physics detectors, there is an ever-increasing need for higher-density interconnects and integration. Conventional processes to fabricate high-density interconnect features of interest required for chip-to-chip, wafer-to-wafer and chip-to-wafer/substrate interconnection in the vertical stacking has been particularly difficult to scale and has remained at ~100- micron pitch. It is, therefore, critical to develop new technologies for reducing cost while increasing the density of high-resolution interconnects for integration of pixelated sensors to readout electronics. One of key approaches for high performance detectors involves high density 2D and 3D packaging and staking of pixelated sensors to readout electronics. This approach requires connection of arrays of thinned integrated circuits to high resistivity silicon sensors with interconnect pitch of 25 microns or less. Thus, this SBIR program will develop a direct 3D printing of high-resolution interconnects (either as micro pillars and/or micro bumps) at room temperature that can be as small as 5-10 microns or as large as 50-100 micron in diameter and less than 25 microns in pitch. Phase I will develop and demonstrate a scalable, low-cost approach for fabricating high-density interconnects with the metals/alloys of interest to high energy physics instrumentation in minutes. In addition to controlling the resolution of interconnects to 5-10 µm in diameter and 20 µm in pitch, this process enables fine control over the microstructure of the deposited material to facilitate functional reliabilities of the interconnects for 3D integration. The preliminary plan will be developed to increase the yield and to reduce the manufacturing cost by developing a multi- nozzle 3D printing approach in Phase II. Additionally, the cost and performance metrics will be evaluated for use in scale-up and optimization activities in Phase II. The ability to directly print fine interconnects has the potential to enable manufacturing of more compact electronic assemblies. The direct print metal plating platform can work for any material that can be electrodeposited of interest to high energy physics instrumentation. The economic/social benefits from successful low-cost, high-yield, high-density interconnects fabrication approach is numerous and can be used in wide range of industries include healthcare, automotive, power transmission and electronics at an increasing rate. In addition to its use for advanced circuit fabrication used in electronics industries, the 3D printer can also impact small industries by providing them with alternate means of manufacturing specialized high-end products in the absence of the high vacuum equipment and clean room facilities for fabrication of functional metallic micro/nanostructures.
Topic Code
C57-30b
Solicitation Number
DE-FOA-0003110

Status
(Ongoing)

Last Modified 9/23/25

Period of Performance
2/12/24
Start Date
4/13/26
End Date
76.0% Complete

Funding Split
$1.4M
Federal Obligation
$0.0
Non-Federal Obligation
$1.4M
Total Obligated
100.0% Federal Funding
0.0% Non-Federal Funding

Activity Timeline

Interactive chart of timeline of amendments to DESC0024811

Transaction History

Modifications to DESC0024811

Additional Detail

Award ID FAIN
DESC0024811
SAI Number
None
Award ID URI
SAI EXEMPT
Awardee Classifications
Small Business
Awarding Office
892430 SC CHICAGO SERVICE CENTER
Funding Office
892401 SCIENCE
Awardee UEI
ZL5LDDLNHGN4
Awardee CAGE
0WFP5
Performance District
OH-10
Senators
Sherrod Brown
J.D. (James) Vance
Modified: 9/23/25