2506377
Project Grant
Overview
Grant Description
SBIR Phase I: Novel cold cathode e-beam sources for advancing semiconductor manufacturing.
The broader impact/commercial impacts of this Small Business Innovation Research (SBIR) Phase I project will be in developing new solutions for semiconductor chip manufacturing for artificial intelligence (AI).
Mask writers are machines that are integral to the semiconductor industry, as these create the stencils (masks) that are sandwiched together to form advanced computer chips.
The number and complexity of the masks required for these chips are increasing beyond the capacity of state-of-the-art machines.
The company is developing a component device that has the potential to introduce disruptive change in the fundamental design of mask writers.
The project will harness this technology to tackle manufacturing bottlenecks in mask production that are caused by the accelerating demand for advanced intensive AI applications.
The work will lead to a more efficient solution for producing semiconductor chips faster and with high computational power.
The project has the potential to effect a financial impact of greater than $20M annually after three years, and to kickstart entry of the fundamental technology into additional market segments.
This Small Business Innovation Research (SBIR) Phase I project will lead to a wafer-scale process for creating controllable cold cathode electron sources that advance integrated circuit design and manufacturing.
Semiconductor chip fabrication is achieved by performing photolithography through stencil masks that are themselves created using either laser- or electron-beam mask writers.
The properties of these tools dictate spatial resolution, precision, and turnaround time.
The multiple electron-beam (multi-beam) writer has achieved the smallest feature sizes, thus displacing the laser writer for artificial intelligence (AI) applications.
The goal of this project is to help eliminate two significant bottlenecks that hinder production and advancement in multi-beam technology:
(1) Beam quality and parallelization (reliability and yield) are physically limited by the industry’s dependence on thermionic (hot) electron sources; and
(2) Escalating processing power for implementing design code for advanced mask sets is stressing computational resources.
The proposed device will provide a means to accelerate chip production using controllable electron beams for faster and higher quality mask writing.
The focus of this project on solving the first bottleneck should also help address the second bottleneck, expanding the degree of complexity of the chip sets that can be designed and manufactured for AI.
This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the foundation's intellectual merit and broader impacts review criteria.
Subawards are not planned for this award.
The broader impact/commercial impacts of this Small Business Innovation Research (SBIR) Phase I project will be in developing new solutions for semiconductor chip manufacturing for artificial intelligence (AI).
Mask writers are machines that are integral to the semiconductor industry, as these create the stencils (masks) that are sandwiched together to form advanced computer chips.
The number and complexity of the masks required for these chips are increasing beyond the capacity of state-of-the-art machines.
The company is developing a component device that has the potential to introduce disruptive change in the fundamental design of mask writers.
The project will harness this technology to tackle manufacturing bottlenecks in mask production that are caused by the accelerating demand for advanced intensive AI applications.
The work will lead to a more efficient solution for producing semiconductor chips faster and with high computational power.
The project has the potential to effect a financial impact of greater than $20M annually after three years, and to kickstart entry of the fundamental technology into additional market segments.
This Small Business Innovation Research (SBIR) Phase I project will lead to a wafer-scale process for creating controllable cold cathode electron sources that advance integrated circuit design and manufacturing.
Semiconductor chip fabrication is achieved by performing photolithography through stencil masks that are themselves created using either laser- or electron-beam mask writers.
The properties of these tools dictate spatial resolution, precision, and turnaround time.
The multiple electron-beam (multi-beam) writer has achieved the smallest feature sizes, thus displacing the laser writer for artificial intelligence (AI) applications.
The goal of this project is to help eliminate two significant bottlenecks that hinder production and advancement in multi-beam technology:
(1) Beam quality and parallelization (reliability and yield) are physically limited by the industry’s dependence on thermionic (hot) electron sources; and
(2) Escalating processing power for implementing design code for advanced mask sets is stressing computational resources.
The proposed device will provide a means to accelerate chip production using controllable electron beams for faster and higher quality mask writing.
The focus of this project on solving the first bottleneck should also help address the second bottleneck, expanding the degree of complexity of the chip sets that can be designed and manufactured for AI.
This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the foundation's intellectual merit and broader impacts review criteria.
Subawards are not planned for this award.
Awardee
Funding Goals
THE GOAL OF THIS FUNDING OPPORTUNITY, "NSF SMALL BUSINESS INNOVATION RESEARCH / SMALL BUSINESS TECHNOLOGY TRANSFER PHASE I PROGRAMS", IS IDENTIFIED IN THE LINK: HTTPS://WWW.NSF.GOV/PUBLICATIONS/PUB_SUMM.JSP?ODS_KEY=NSF24579
Grant Program (CFDA)
Awarding / Funding Agency
Place of Performance
Irvine,
California
92603-3410
United States
Geographic Scope
Single Zip Code
Julia Jean was awarded
Project Grant 2506377
worth $305,000
from National Science Foundation in June 2025 with work to be completed primarily in Irvine California United States.
The grant
has a duration of 1 year and
was awarded through assistance program 47.084 NSF Technology, Innovation, and Partnerships.
The Project Grant was awarded through grant opportunity NSF Small Business Innovation Research / Small Business Technology Transfer Phase I Programs.
SBIR Details
Research Type
SBIR Phase I
Title
SBIR Phase I: Novel Cold Cathode E-Beam Sources for Advancing Semiconductor Manufacturing
Abstract
The broader impact/commercial impacts of this Small Business Innovation Research (SBIR) Phase I project will be in developing new solutions for semiconductor chip manufacturing for artificial intelligence (AI). Mask writers are machines that are integral to the semiconductor industry, as these create the stencils (masks) that are sandwiched together to form advanced computer chips. The number and complexity of the masks required for these chips are increasing beyond the capacity of state-of-the-art machines. The company is developing a component device that has the potential to introduce disruptive change in the fundamental design of mask writers. The project will harness this technology to tackle manufacturing bottlenecks in mask production that are caused by the accelerating demand for advanced intensive AI applications. The work will lead to a more efficient solution for producing semiconductor chips faster and with high computational power. The project has the potential to effect a financial impact of greater than $20M annually after three years, and to kickstart entry of the fundamental technology into additional market segments.
This Small Business Innovation Research (SBIR) Phase I project will lead to a wafer-scale process for creating controllable cold cathode electron sources that advance integrated circuit design and manufacturing. Semiconductor chip fabrication is achieved by performing photolithography through stencil masks that are themselves created using either laser- or electron-beam mask writers. The properties of these tools dictate spatial resolution, precision, and turnaround time. The multiple electron-beam (multi-beam) writer has achieved the smallest feature sizes, thus displacing the laser writer for artificial intelligence (AI) applications. The goal of this project is to help eliminate two significant bottlenecks that hinder production and advancement in multi-beam technology: (1) Beam quality and parallelization (reliability and yield)
Topic Code
S
Solicitation Number
NSF 24-579
Status
(Ongoing)
Last Modified 4/4/25
Period of Performance
6/1/25
Start Date
5/31/26
End Date
Funding Split
$305.0K
Federal Obligation
$0.0
Non-Federal Obligation
$305.0K
Total Obligated
Activity Timeline
Additional Detail
Award ID FAIN
2506377
SAI Number
None
Award ID URI
SAI EXEMPT
Awardee Classifications
Small Business
Awarding Office
491503 TRANSLATIONAL IMPACTS
Funding Office
491503 TRANSLATIONAL IMPACTS
Awardee UEI
EMYZH3MUHNV5
Awardee CAGE
9PJZ0
Performance District
CA-47
Senators
Dianne Feinstein
Alejandro Padilla
Alejandro Padilla
Modified: 4/4/25