Table-top Vacuum- and Extreme-Ultraviolet Source

Background
NIST is seeking information from sources that may be capable of providing a commercial item solution that meets or exceeds the following draft minimum specifications. The requirement is for a laboratory-based, “turn-key” solution providing selectable vacuum- and extreme-ultraviolet (EUV, VUV) wavelengths. The project being pursued will allow the measurement of nanoscale semiconductor patterns by shining EUV and VUV light onto such samples and measuring with a camera system the reflected, diffracted, and scattered light to determine the dimensions of these patterned features.

Work Details
A Table-top Vacuum- and Extreme-Ultraviolet Source: Quantity (1) is required to generate light at wavelengths in the extreme and vacuum ultraviolet (VUV and EUV), specifically 10 nm through 150 nm. The contractor shall provide a VUV+EUV Source that meets the minimum specifications including output characteristics, photon flux, output stability and monitoring, divergence and spot size, components and interoperability, pre-delivery requirements, installation, and additional capabilities.

Place of Performance
The Contractor shall be responsible for delivery to NIST Gaithersburg, MD campus. The laboratory’s usable space is 25 feet by 12 feet (7.62 m by 3.66 m).