Mask Aligner for Photolithography

Background
The US Army Medical Research Acquisition Activity (USAMRAA) is seeking qualified sources to provide a photolithography mask aligner for prototyping electrode designs. This initiative supports the U.S. Army Medical Research Institute of Chemical Defense (USAMRICD). The contract aims to procure commercial products or services under streamlined procedures for evaluation and solicitation. This solicitation is set aside for small businesses, with a focus on enhancing the capabilities of the USAMRICD.

Work Details
The contract requires the delivery of a photolithography mask aligner with the following specifications:
- Must pass ultraviolet (UV) light through a photomask to create patterns on an aligned ceramic substrate.
- Resolution of patterns should be 2 microns or less.
- Capable of exposing an area equivalent to a standard 6” silicon wafer.
- Must support both soft and hard contact exposure.
- Generate UV light at 365nm compatible with standard SU-8 photoresist.
- Digital control of operating parameters via an integrated programmable logic controller or computer.
- All IT components must be Trade Agreement Act (TAA) compliant.
- Must operate without cloud reliance, ensuring data remains on premises, and should not record, transmit, or store data beyond operational functions.
- Wi-Fi and Bluetooth functionalities must be either absent or disabled.
- No cleanroom required for operation.
- Electrical requirements: 115V or 230V at 50/60 Hz.
Delivery is expected within 20 weeks post-contract award, with installation at USAMRICD located on Aberdeen Proving Ground, MD. Options for onboarding training and service maintenance for up to three years are also included.

Period of Performance
Delivery expected within 20 weeks after contract award.

Place of Performance
Aberdeen Proving Ground, MD