Focused Ion Beam Scanning Electron Microscope (FIB-SEM) Instrument

Background
The National Institute of Standards and Technology (NIST) is seeking a Focused Ion Beam (FIB) and Scanning Electron Microscope (SEM) instrument to enhance metrology capabilities for the semiconductor manufacturing ecosystem. This initiative is part of the CHIPS Metrology program, which aims to address critical metrology gaps and spur innovation within the semiconductor industry.

The FIB/SEM instrument will facilitate customized measurements and traditional workflows, including sample preparation for various advanced microscopy techniques.

Work Details
The contract includes the following line items:
- **CLIN 0001**: FIB/SEM system inclusive of delivery, installation, and training. Quantity: 1 Each.
- **CLIN 0002**: 5-year warranty for CLIN 0001. Quantity: 5 Years.
- **CLIN 0003**: Transportation and other related charges (Not to Exceed amount). Quantity: 1 Each.

**Minimum Requirements for FIB/SEM System:**
- **Ga+ ion column** with spatial resolution better than 5 nm at 30 kV, accelerating voltage range from 500 V to 30 kV, probe current range at 30 kV from 1 pA to 60 nA, and guaranteed source lifetime exceeding 1000 hours.
- **Electron column** must operate in immersion and field-free modes with spatial resolutions better than 0.6 nm at eucentric working distance on bulk samples and better than 0.4 nm in STEM mode.
- **Detectors** must include an in-chamber electron detector, an in-chamber ion detector, multiple in-lens electron detectors, segmented back-scatter detectors, a pixelated STEM detector with at least 256 × 256 pixels, and an Energy Dispersive X-ray Spectrometer (EDS) with specific performance criteria.

Place of Performance
The installation locations are within the Advanced Measurement Lab on NIST’s Gaithersburg, MD campus.