Diffraction Instrument Stage

Background
This project involves an existing NIST Synchrotron beamline at the National Synchrotron Light Source II (NSLS-II) and an existing CRADA with IBM. Its purpose is to improve the X-ray Absorption Spectroscopy (XAS) measurement capabilities for state of the art semiconductor samples working directly with IBM researchers stationed at NIST’s Beamline for Materials Measurement (BMM) and other researchers studying materials for information technology. The proposed detector enhancement will substantially increase sample throughput and measurement sensitivity, driving the ability to probe semiconductor device interfaces, a broader set of element/matrix combinations, and nanoscale structures in device stacks. These enhanced capabilities will become broadly available to the US Semiconductor Industry by allocation of beam time at the BMM via NIST’s Partner User Agreement with NSLS-II (DOE). This broad and rapid accessibility of the new x-ray beamline metrology will directly enhance innovation and competitiveness in the US Semiconductor Industry.

Work Details
The goal of this contract is to deliver a three axis XYZ stage for an X-ray detector. The Contractor shall provide a system that meets all technical specifications identified. All items must be new. Used or remanufactured equipment will not be considered for award. Experimental, prototype, or custom items will not be considered. The use of “gray market” components are not authorized for sale in the U.S. by the Contractor is not acceptable.

Period of Performance
The period of performance will take approximately 28 weeks ARO.

Place of Performance
All work shall be performed at NIST’s Beamline for Materials Measurement (BMM) at the National Synchrotron Light Source II, Brookhaven National Laboratory, Upton NY 11973.