Combined Synopsis/Solicitation: X-ray Photoelectron Spectroscopy (XPS) System with additional tools   3

Background
The National Institute of Standards and Technology (NIST) is seeking to enhance its capabilities in measurement science critical to semiconductor manufacturing. The agency's CHIPS Metrology program aims to improve the development of new materials and production methods for chipmakers. The X-ray Photoelectron Spectroscopy (XPS) System will support various research projects within this program, including evaluating surface and chemical composition, probing buried interfaces, and understanding electronic structures.

Work Details
The contractor is required to deliver, install, and validate a new X-ray Photoelectron Spectroscopy (XPS) System that meets the following specifications:
- **CLIN 0001:**
- **Description:** X-ray Photoelectron Spectroscopy (XPS) System
- **Quantity:** 1
- **Specifications:**
- Ultra High Vacuum (UHV) System with a base pressure of < 2 x 10^-7 Pa.
- Dedicated vacuum pumping system.
- Leaded glass observation windows.
- Vacuum gauges for monitoring pressure from atmospheric down to <<1 x 10^-7 Pa.
- Software-controlled bakeout capability.
- Pneumatic and mechanical valves for isolation from external conditions.
- Sample load-lock or entry chamber capable of pumping down sample holders to < 2 x 10^-6 Pa before introduction to the UHV analysis chamber.