RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching
Type: Forecast • Source ID: 64924
Overview
Description
Obtain scientific services to support fundamental metrology research for the development and operation of advanced optical diagnostics for plasma etching processes under the CHIPS R&D Metrology program project 5.04, RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching. The Contractor shall provide technical services for plasma etch chamber assembly and operation, in situ optical diagnostics, temporally and spatially resolved optical emission spectroscopy, mid-infrared laser absorption spectroscopy, Langmuir probe measurements, data processing and interpretation, correlation of diagnostic results with time-resolved frequency-comb and radio frequency (RF) waveform measurements, model validation support, and preparation of technical materials for NIST review and dissemination.
Est. Value
Min: $250,000
Max: $500,000
Max: $500,000
Est. Award Date
1st quarter FY2027
Future Opp
Source Est. Solicitation Date
1st quarter FY2027
Set Aside
Small Business
Procurement Method
Competed
Forecast Type
New Requirement
Place of Performance
GAITHERSBURG, MD USA
Forecast Source
Department of Commerce
National Institute of Standards and Technology is forecasted to issue a new procurement for RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching around 1st quarter FY2027 worth up to $500,000.
Agency
Source Level 1 Agency
Department of Commerce
Source Level 2 Agency
NIST - PROGRAM OFFICE
Source Level 3 Agency
AD for Laboratory Programs
Contacts
Potential Bidders and Partners
Similar Active Opportunities
Additional Detail
Date Published
9/18/26
Date Modified
9/2/26
Additional Notes
Workspace number: REQUIREMENTS-26-4924; Date created: 2026-09-18 00:00:00; Organization unit: NIST - ALP; Months: 0; Years: 2; Anticipated action award type: Delivery/Task Order; IT indicator: N.
Source Forecast ID
64924