Custom Diffractometry and Fourier Ptychography Endstation

The NDCD needs to acquire a customized diffractometry end station, which will be a new experimental apparatus that will harness short wavelength EUV light for the non-destructive three-dimensional measurement of the smallest features of computer chips, their transistors. This procurement supports the CHIPS R&D Metrology Program's Grand Challenge 2 to advance metrology for future microelectronics manufacturing and project 2.07, EUV Scatterometry. The application of the required end station is the accurate quantitative reconstruction of dimensional structure of periodic and other patterned features from the reflective diffraction off a sample under test using EUV light, which will only propagate in a vacuum.